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HandWiki. Czochralski Process. Encyclopedia. Available online: https://encyclopedia.pub/entry/36346 (accessed on 24 September 2026).
HandWiki. Czochralski Process. Encyclopedia. Available at: https://encyclopedia.pub/entry/36346. Accessed September 24, 2026.
HandWiki. "Czochralski Process" Encyclopedia, https://encyclopedia.pub/entry/36346 (accessed September 24, 2026).
HandWiki. (2022, November 24). Czochralski Process. In Encyclopedia. https://encyclopedia.pub/entry/36346
HandWiki. "Czochralski Process." Encyclopedia. Web. 24 November, 2022.
Czochralski Process
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The Czochralski process is a method of crystal growth used to obtain single crystals of semiconductors (e.g. silicon, germanium and gallium arsenide), metals (e.g. palladium, platinum, silver, gold), salts and synthetic gemstones. The process is named after Polish scientist Jan Czochralski, who invented the method in 1915 while investigating the crystallization rates of metals. He made this discovery by accident: instead of dipping his pen into his inkwell, he dipped it in molten tin, and drew a tin filament, which later proved to be a single crystal. The most important application may be the growth of large cylindrical ingots, or boules, of single crystal silicon used in the electronics industry to make semiconductor devices like integrated circuits. Other semiconductors, such as gallium arsenide, can also be grown by this method, although lower defect densities in this case can be obtained using variants of the Bridgman-Stockbarger technique.

single crystal silicon single crystals crystal growth

References

  1. Czochralski Crystal Growth Method. Bbc.co.uk. 30 January 2003. Retrieved on 2011-12-06. https://www.bbc.co.uk/dna/h2g2/A912151
  2. Aleksic, Jalena et al. (2002). "Temperature and Flow Visualization in a Simulation of the Czochralski Process Using Temperature-Sensitive Liquid Crystals". Ann. N.Y. Acad. Sci. 972 (1): 158–163. doi:10.1111/j.1749-6632.2002.tb04567.x. Bibcode: 2002NYASA.972..158A.  https://dx.doi.org/10.1111%2Fj.1749-6632.2002.tb04567.x
  3. Doubts over 450mm and EUV. Electronicsweekly.com. December 30, 2013. Retrieved on 2014-01-09. http://www.electronicsweekly.com/news/business/doubts-over-450mm-and-euv-2013-12/
  4. "Czochralski Process". http://www.theimage.com/newgems/synthetic/syntheticanimate2.html. 
  5. Li, Z.; Kraner, H.W.; Verbitskaya, E.; Eremin, V.; Ivanov, A.; Rattaggi, M.; Rancoita, P.G.; Rubinelli, F.A. et al. (1992). "Investigation of the oxygen-vacancy (A-center) defect complex profile in neutron irradiated high resistivity silicon junction particle detectors". IEEE Transactions on Nuclear Science 39 (6): 1730. doi:10.1109/23.211360. Bibcode: 1992ITNS...39.1730L. https://digital.library.unt.edu/ark:/67531/metadc1059922/. 
  6. Lindström, G; Ahmed, M; Albergo, S; Allport, P; Anderson, D; Andricek, L; Angarano, M.M; Augelli, V et al. (2001). "Radiation hard silicon detectors—developments by the RD48 (ROSE) collaboration". Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment 466 (2): 308. doi:10.1016/S0168-9002(01)00560-5. Bibcode: 2001NIMPA.466..308L.  https://dx.doi.org/10.1016%2FS0168-9002%2801%2900560-5
  7. CERN RD50 Status Report 2004, CERN-LHCC-2004-031 and LHCC-RD-005 and cited literature therein
  8. Harkonen, J; Tuovinen, E; Luukka, P; Tuominen, E; Li, Z; Ivanov, A; Verbitskaya, E; Eremin, V et al. (2005). "Particle detectors made of high-resistivity Czochralski silicon". Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment 541 (1–2): 202–207. doi:10.1016/j.nima.2005.01.057. Bibcode: 2005NIMPA.541..202H.  https://dx.doi.org/10.1016%2Fj.nima.2005.01.057
  9. Custer, J. S.; Polman, A.; Van Pinxteren, H. M. (1994). "Erbium in crystal silicon: Segregation and trapping during solid phase epitaxy of amorphous silicon". Journal of Applied Physics 75 (6): 2809. doi:10.1063/1.356173. Bibcode: 1994JAP....75.2809C.  https://dx.doi.org/10.1063%2F1.356173
  10. Eikelboom, J.A., Jansen, M.J., 2000. Characterisation of PV modules of new generations; results of tests and simulations . Report ECN-C-00-067, 18. http://www.ecn.nl/docs/library/report/2000/c00067.pdf
  11. James D. Plummer, Michael D. Deal, and Peter B. Griffin, Silicon VLSI Technology, Prentice Hall, 2000, ISBN:0-13-085037-3 pp. 126–27
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