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William Chiappim: History
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  • ALD
  • PEALD
  • Cold Plasma
  • Nanotechnology
  • Antimicrobial Effect
  • Thin Films
  • Plasma-activated Liquid

Basic Information

William Chiappim
Name: William Chiappim
(Dec 1978–)
Birth
Location:
São Paulo - Brazil
Title: Physicist Ph.D.
Affiliation: São Paulo State University - UNESP
Honor: Unknown

Bachelor in Physics and Master in Applied Physics from Universidade Estadual Paulista Júlio de Mesquita Filho (UNESP) - Campus Rio Claro. Doctor in Plasma Physics from the Instituto Tecnológico de Aeronáutica (ITA). Post-Doctoral Internship at Escola Politécnica da USP (2017-2019) at the Department of Electrical Engineering at the Laboratory of Integrable Systems with an international internship at the International Iberian Nanotechnology Laboratory (INL) - Braga - Portugal, both funded by FAPESP - grant nº 2016 / 17826-7, the project focused on the growth of dielectrics applied in the Technological Development of prototypes of Metal-Oxide-Semiconductor (MOS) solar cells. Post-Doctoral Internship at the University of Aveiro - Portugal (2019-2020) at the Department of Physics and Institute of Nanostructures, Nanomodeling and Nanofabrication (i3N) under the Integrated R&D Program SusPhotoSolutions - Sustainable Photovoltaic Solutions, (European Union) grant nº CENTRO -01-0145-FEDER-000005 with emphasis on Technological Development of Photovoltaic Devices based on Thin Film Technology. Post-Doctoral Internship at the Instituto Tecnológico de Aeronáutica - ITA (2020-2022) - at the Department of Physics and Laboratory of Plasmas and Processes (LPP) whose emphasis was on: (i) developing and characterizing a liquid generation system activated by cold plasma and (ii) apply plasma-activated liquids in endodontic treatment (FAPESP - grant nº 2020 / 10450-7). Assistant Professor Doctor in the area of ​​knowledge PHYSICS OF FLUIDS, PHYSICS OF PLASMAS, AND ELECTRICAL DISCHARGES at the Physics Department of the Faculty of Engineering and Science of the Campus of Guaratinguetá - Universidade Estadual Paulista Júlio de Mesquita Filho (UNESP).

It is worth mentioning that the researcher has relevant skills:
1) Dr. William Chiappim has extensive experience in the study and application of plasmas in dielectric barrier discharge (DBD) at ambient and sub-atmospheric pressure in textiles (https://doi.org/10.3390/ polym12092128), activation of water and liquids by gliding arc plasmas, and growth of nanomaterials by techniques that use inductively coupled plasma (ICP) and capacitively coupled plasma (CCP) reactors.
2) Dr. William Chiappim has extensive experience in the study of nanostructures, with emphasis on thin films of TiO2, Al2O3, nanolaminates of the Al2O3/TiO2 type, Ag2S nanoparticles, Sb2Se3 nanoparticles, silica aerogels, and semiconductors of the type (Cu(In, Ga)Se2), (Cu2ZnSn(S,Se)4) and (Cu2ZnSnS4), as well as the discussion of their growth mechanisms, and applications of the cited materials in several areas of knowledge.
3) Dr. William Chiappim has proven experience by publications in peer-reviewed scientific articles in spectroscopic characterizations, namely, Photoluminescence Spectroscopy (PL), Raman Spectroscopy, UV-VIS Spectroscopy, Rutherford Backscatter Spectroscopy (RBS), X-Ray-excited Photoelectron Spectroscopy  (XPS), and Infrared Spectroscopy (FTIR), in addition to electrical (current vs. voltage curves), optical (Optical Emission Spectroscopy (OES)), ionized particle flux (Langmuir Probe), and chemical composition of cold plasmas (Molecular Beam Mass Spectroscopy).
4)Dr. William Chiappim has a remarkable experience in collaboration (in the last five years, he has published in international journals in partnership with more than 40 co-authors and more than 20 national and international partner institutions).

It is worth mentioning his international experience through a post-doctoral internship at the University of Aveiro - Portugal, and a short internship at the International Iberian Nanotechnology Laboratory. Dr. William Chiappim is the first student in Latin America to obtain a doctoral thesis on atomic layer deposition (ALD).

Further Reading
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