Sulfamethoxazole (SMX) and tetracycline are widely used antibiotics, which are mostly used for the treatment of human beings and animals [
58]. These antibiotics are usually detected in wastewater, surface water, and groundwater in the detection range of ng L
−1 to μg L
−1 [
59,
60]. Specifically, sulfamethoxazole (SMX), which comes under the chemical class of sulfonamide compounds, is an antimicrobial drug with broad-spectrum activity against gram-positive and negative bacteria [
61]. The pharmaceutical waste, of which the antibiotic is a part, is usually hydrolyzed in water. The understanding of the degree and behavior of hydrolysis of antibiotics is of prime concern to understand their stability and non-biodegradability in the environment [
62]. Sulfamethoxazole possesses good chemical stability in the environment, which allows it to resist metabolic processes and natural degradation [
63]. The SMX usually absorbs the incident radiation light in the wavelength range of 250 to 300 nm, which also varies with respect to the change in the surface charge density on the SMX as the pH of the aqueous solution varies from acidic to alkaline [
64]. The absorbance range reportedly shifted towards a higher wavelength side (up to 300 nm) as the pH of the aqueous solution was reduced to 1 from 10 (
Figure 2) [
64]. The pH of the solution plays a key role in the photocatalytic decomposition of SMX in water, as the SMX degradation rate reportedly was decreased with the increase in the pH value of the aqueous solution, as shown in
Figure 3a [
28]. The SMX mostly exists in the anionic form if pH > 5.6, and in the neutral form if pH lies between 1.85–5.6 (
Figure 3b), as the pK
a1 and pK
a2 values of SMX was reported to be about 1.85 and 5.60, respectively [
28,
64]. The photolytic degradation of SMX is very difficult as it cannot be completely mineralized during oxidation [
28]. Previous studies elucidated the photocatalytic oxidation mechanism of SMX and the formation of intermediatory transformation products (TPs) [
28,
64]. The detailed mechanism of SMX photodegradation in the presence of reactive oxygen species (ROS), i.e., •OH radical is shown in
Figure 4. It can be observed from the figure that SMX formed its isomerization intermediatory product and is denoted by P 254. Subsequently, with the addition of •OH radical, the SMX is degraded to an intermediatory product denoted by 270 c. Thereafter, the addition of •֗OH radical to the transformation product (TP) defined as 270 c led to the demethylation process, which resulted in the formation of a new TP denoted by P 288. Subsequently, the breakage of the N–O bond and the removal of the carboxylic group from P 288 lead to the formation of another TP denoted by P 246. Additionally, the release of N–O and C–C bonds from P 288 formed another intermediatory product or TP denoted by P 198. The cleavage of the S–N bond from the SMX structure was reportedly occurred after reacting with an •OH free radical following the binding of N to an H atom, which leads to the formation of another TP called 3-amino 5-methylisoxazole denoted as P 99 [
64]. The isomerized product of SMX is denoted by P 254, which, after reacting with •OH free radical, leads to the scission of S–N bond from P 254 that leads to the formation of a TP denoted by P 174. The P 174 on further oxidation with ROS leads to the formation of two new TPs denoted as P 158 and P 95, respectively, following the loss of C–N and C–S bonds.