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Phase Behavior of Blend Materials
Blend materials refer to two or more polymers are formed by mixing together by physical or chemical methods, such as mixing block copolymers with block copolymers, block copolymers with homopolymers.
In recent years, more and more attention has been paid to the self-assembly of block copolymers because it has great application prospects in the field of integrated circuits, biology, and many other fields. In the field of integrated circuits, nanostructures in electronic devices are fabricated by photolithography. Due to the diffraction limit of the radiation source, lithography faces inherent challenges in reducing the critical size to less than 20 nm. Thus, we need to discover a new technology to replace it. According to the international technology roadmap for semiconductors, the solutions of next-generation lithography mainly include extreme ultraviolet lithography , nanoimprint lithography , and block copolymer self-assembly . At present, extreme ultraviolet lithography is the most widely used technology. However, its manufacturing cost is also the highest . Nanoimprint requires a high-precision template, but the cost of template manufacturing is high, and the yield is limited. Block copolymer self-assembly has natural advantages over other technologies concerning cost and process. Block copolymer self-assembly can form hexagonal cylinders, cubic spheres, alternative lamellae, and bicontinuous gyroids. At the same time, the process of block copolymer self-assembly is relatively simple, which can greatly shorten the manufacturing time.In the research into block copolymer self-assembly technology, it is necessary to constantly reduce the size of the structure and innovate the process. Nowadays, the self-assembly of block copolymers can form nanostructures of 1–100 nm . Researchers have explored the properties of block copolymers from the material itself, such as material synthesis, from the initial binary block copolymers to the present ternary or even multivariate block copolymers. In addition, a number of research groups have explored the self-assembly of block copolymers in many ways. On the one hand, the self-assembly morphology can be adjusted by changing the components of the two blocks in the binary block copolymer. On the other hand, the self-assembly morphology can be controlled by changing the molecular weight of the block copolymer. In order to obtain rich micro-region morphology of self-assembled block copolymers, researchers control and adjust the relevant process conditions to achieve this goal. For example, a temperature field , temperature gradient field , solvent field , shear field , magnetic field , and electric field  can be applied to control the morphology of self-assembled block copolymers. Both industry and academia have conducted a great deal of research into the morphology of field-regulated block copolymers. For example, Hashimoto et al. designed a temperature gradient instrument to control the microstructure of block copolymers . Kim and Libera have studied the effect of solvents on the morphology of triblock copolymer films under different evaporation rates . Morkved and his colleagues first studied block copolymer films on silicon nitride films under a plane electric field .
2. Analysis on Results
2.1. Atmosphere Affects the Phase Separation
2.2. Ratio Affects the Phase Separation
2.3. Molecular Weight Affects the Phase Separation
|Sample (PS-b-PC) No.||Mn (g/mol)||MW (g/mol)||PDI|
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